Robust coating of indium selenide monolayer inks for wafer-scale, CMOS-compatible, high mobility thin film transistors
Crossref DOI link: https://doi.org/10.1007/s40843-025-3304-7
Published Online: 2025-05-06
Published Print: 2025-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ran, Wenhao
Shen, Guozhen
Text and Data Mining valid from 2025-05-06
Version of Record valid from 2025-05-06
Article History
Received: 12 February 2025
Accepted: 26 February 2025
First Online: 6 May 2025