Atomic-scale mechanisms for superhard HfB2 films via vacancy engineering and compressive stress
Crossref DOI link: https://doi.org/10.1007/s40843-025-3816-y
Published Online: 2025-11-24
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, Kaiwen
Gao, Xinxin
Wen, Mao
Zheng, Weitao
Zhang, Kan
Text and Data Mining valid from 2025-11-24
Version of Record valid from 2025-11-24
Article History
Received: 30 August 2025
Accepted: 10 November 2025
First Online: 24 November 2025
Ethics
: Conflict of interest The authors declare that they have no conflict of interest.