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Isotope-engineered hexagonal boron nitride films synthesized by plasma-enhanced chemical vapor deposition method from elemental boron and nitrogen precursors

Crossref DOI link: https://doi.org/10.1007/s40843-025-3862-x

Published Online: 2026-03-02

Published Print: 2026-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Ning, Congcong

Qing, Fangzhu

Zhu, Qinglong

Guo, Xiaomeng

Zhang, Hao

Luo, Jun

Li, Jiawei

Zhu, Hongwei

Li, Xuesong
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Text and Data Mining valid from 2026-03-02

Version of Record valid from 2026-03-02
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Article History

Received: 13 September 2025

Accepted: 25 November 2025

First Online: 2 March 2026

Ethics

: Conflict of interest The authors declare that they have no conflict of interest.

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