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Etching Characteristics of Quartz Crystal Wafers Using Argon-Based Atmospheric Pressure CF4 Plasma Stabilized by Ethanol Addition

Published Online: 2019-07-24

Published Print: 2019-09

Authors

Sun, Rongyan

Yang, Xu

Watanabe, Keiichiro

Miyazaki, Shiro

Fukano, Toru

Kitada, Masanobu

Arima, Kenta

Kawai, Kentaro

Yamamura, Kazuya
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Text and Data Mining valid from 2019-07-24

Version of Record valid from 2019-07-24
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Article History

Received: 26 April 2019

Revised: 4 June 2019

Accepted: 15 June 2019

First Online: 24 July 2019

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