Crossmark

Spectroscopic Analysis of Film Stress Mechanism in PECVD Silicon Nitride

Crossref DOI link: https://doi.org/10.1007/s42341-018-0006-z

Published Online: 2018-01-29

Published Print: 2018-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Jang, Bo Eun

Hong, Sang Jeen
License Information

Text and Data Mining valid from 2018-01-29
More Information

Article History

Received: 31 March 2017

Revised: 20 October 2017

Accepted: 23 October 2017

First Online: 29 January 2018