Design and Analysis of Gate Engineered Dual Material Gate Double Gate Impact Ionization Metal Oxide Semiconductor
Crossref DOI link: https://doi.org/10.1007/s42341-018-0080-2
Published Online: 2018-11-19
Published Print: 2019-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Solay, Leo Raj
Singh, Sarabdeep
Amin, S. Intekhab
Anand, Sunny
Text and Data Mining valid from 2018-11-19
Article History
Received: 2 May 2018
Revised: 30 October 2018
Accepted: 13 November 2018
First Online: 19 November 2018