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Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma

Published Online: 2022-08-04

Published Print: 2022-10

Authors

Woo, Jong-Chang

Kim, Dong-Pyo

Kim, Gwan-Ha https://orcid.org/0000-0002-3914-2642
Funding

Funding for this research was provided by:

Ministry of Education (2018R1D1A1B07051202)
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Text and Data Mining valid from 2022-08-04

Version of Record valid from 2022-08-04
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Article History

Received: 3 February 2022

Revised: 23 May 2022

Accepted: 18 June 2022

First Online: 4 August 2022

Document is current