Performance Analysis of the Gate All Around Nanowire FET with Group III–V Compound Channel Materials and High-k Gate Oxides
Crossref DOI link: https://doi.org/10.1007/s42341-023-00438-8
Published Online: 2023-05-12
Published Print: 2023-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shandilya, Shashank
Madhu, Charu http://orcid.org/0000-0002-3301-9897
Kumar, Vijay
Text and Data Mining valid from 2023-05-12
Version of Record valid from 2023-05-12
Article History
Received: 2 January 2023
Revised: 31 March 2023
Accepted: 13 April 2023
First Online: 12 May 2023