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Fabrication of an In-rich IGZO TFT by Co-sputtering of In2O3 and IGZO and Characterization of its Compensated Positive Bias Stress Properties

Published Online: 2024-10-29

Published Print: 2025-02

Authors

Lee, Yedam

Kim, Hyunsoo

Jo, Hyerin

Oh, Hongseok https://orcid.org/0000-0003-1212-2278
Funding

Funding for this research was provided by:

Ministry of Education (2022R1F1A1072437, 2021R1A6A1A10044154)

Ministry of Science and IC (No.2022-0-01188)
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Text and Data Mining valid from 2024-10-29

Version of Record valid from 2024-10-29
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Article History

Received: 25 May 2024

Revised: 29 September 2024

Accepted: 9 October 2024

First Online: 29 October 2024

Declarations

:

: The authors declare no competing interests.

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