Crossmark

Spectroscopic ellipsometry investigation to study the microstructure evolution in boron-doped amorphous silicon films as a result of hydrogen dilution

Crossref DOI link: https://doi.org/10.1007/s42452-021-04495-7

Published Online: 2021-03-24

Published Print: 2021-04

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Kanneboina, Venkanna https://orcid.org/0000-0002-8351-9670
Agarwal, Pratima
Funding

Funding for this research was provided by:

Department of Science and Technology (DST), India (DST/TM/SERI/2K11/78(G))

Defence Research and Development Organization (DRDO), India (ERIP/ER/0900376/M/01/1297)
License Information

Text and Data Mining valid from 2021-03-24

Version of Record valid from 2021-03-24
More Information

Article History

Received: 20 November 2020

Accepted: 9 March 2021

First Online: 24 March 2021

Declarations

:

: The authors declare that they have no conflict of interest.

Document is current

Any future updates will be listed below