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Hysteresis Improvement of Low-Temperature Polycrystalline Silicon Thin-Film Transistors by N2O Plasma Surface Treatment

Published Online: 2025-03-06

Published Print: 2025-05

Authors

Kim, Dae Woong

Moon, Kook Chul

Im, Hwarim

Kim, Yong-Sang https://orcid.org/0000-0003-2986-2686
Funding

Funding for this research was provided by:

Sungkyunkwan University
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Text and Data Mining valid from 2025-03-06

Version of Record valid from 2025-03-06
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Article History

Received: 19 October 2024

Revised: 20 January 2025

Accepted: 22 January 2025

First Online: 6 March 2025

Declarations

:

: The authors declare that we have no competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

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