Crossmark

Optimization of the fabrication process for TiOx/Al2O3 bilayer memristor to enhance the switching uniformity and reliability

Published Online: 2025-03-14

Published Print: 2025-05

Authors

Kim, Hae Jin https://orcid.org/0009-0006-6284-3056
Kim, Seung Soo

Park, So Jeong

Oh, Yura

Han, Sua
Funding

Funding for this research was provided by:

University of Suwon (2022-0122)
License Information

Text and Data Mining valid from 2025-03-14

Version of Record valid from 2025-03-14
More Information

Article History

Received: 21 January 2025

Revised: 19 February 2025

Accepted: 26 February 2025

First Online: 14 March 2025

Declarations

:

: The authors declare no conflict of interest.

Document is current