Hou, Yanjin
Guo, Yanhua
Wang, Jintao
Hou, Siyu
Cai, Lijun
Huang, Ying
Liu, Zhizhen
Funding for this research was provided by:
High-power pulse magnetron sputtering composite power supply and plasma control technology (2022ZJ1212)
Article History
Received: 15 April 2024
Revised: 20 January 2025
Accepted: 22 January 2025
First Online: 7 March 2025
Declarations
:
: On behalf of all authors, the corresponding author states that there is no conflict of interest.