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Dielectric engineering in 18 nm double gate FinFETs: comparative analysis of high-K materials for enhanced device performance

Published Online: 2025-09-10

Authors

Sarangam, K.

Mirappalli, Dharani Kumar Chowdary

Kumar, Aruru Sai

Reddy, Ch. Rama Prakasha
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Text and Data Mining valid from 2025-09-10

Version of Record valid from 2025-09-10
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Article History

Received: 27 June 2025

Accepted: 28 August 2025

First Online: 10 September 2025

Declarations

:

: The authors have no relevant financial or non-financial interests to disclose.

: Data will be made available on request.

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