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Investigating the Planarization of Al0.5CoCrFeNi2 High-Entropy Thin Films Through Chemical Mechanical Polishing

Published Online: 2023-05-23

Published Print: 2023-09

Authors

Lee, Chih-Chen

Lee, Chung-Yu

Chang, Shao-Fu

Chen, Shih-Hsun https://orcid.org/0000-0002-5750-6470
Funding

Funding for this research was provided by:

National Science and Technology Council (111-2221-E-A49 -195 -)
License Information

Text and Data Mining valid from 2023-05-23

Version of Record valid from 2023-05-23
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Article History

Received: 10 April 2023

Accepted: 11 May 2023

First Online: 23 May 2023

Declarations

:

: The authors declare no conflict of interest.

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