Hausdorff Distance Driven L-Shape Matching Based Layout Decomposition for E-Beam Lithography
Crossref DOI link: https://doi.org/10.1007/978-981-10-7470-7_29
Published Online: 2017-12-21
Published Print: 2017
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Sinharay, Arindam
Roy, Pranab
Rahaman, Hafizur
License valid from 2017-01-01