Hydrogenated amorphous carbon thin films deposited by plasma-assisted chemical vapor deposition enhanced by electrostatic confinement: structure, properties, and modeling
Crossref DOI link: https://doi.org/10.1007/s00339-014-8510-4
Published Online: 2014-06-11
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Dufrène, S. M. M.
Cemin, F.
Soares, M. R. F.
Aguzzoli, C.
Maia da Costa, M. E. H.
Baumvol, I. J. R.
Figueroa, C. A.
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