Lateral resolution in focused electron beam-induced deposition: scaling laws for pulsed and static exposure
Crossref DOI link: https://doi.org/10.1007/s00339-014-8751-2
Published Online: 2014-09-18
Published Print: 2014-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Szkudlarek, Aleksandra
Szmyt, Wojciech
Kapusta, Czesław
Utke, Ivo
License valid from 2014-09-18