The voxel onset time as an in situ method to evaluate focal position effects on two-photon-induced lithography
Crossref DOI link: https://doi.org/10.1007/s00339-015-9449-9
Published Online: 2015-08-29
Published Print: 2015-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Engelhardt, Sascha
Tempeler, Jenny
Wehner, Martin
Funding for this research was provided by:
European Comission FP7 (263416)
European EFRE program (290047022)
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