On the origin of contact resistances in graphene devices fabricated by optical lithography
Crossref DOI link: https://doi.org/10.1007/s00339-015-9582-5
Published Online: 2016-01-12
Published Print: 2016-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chavarin, Carlos Alvarado
Sagade, Abhay A.
Neumaier, Daniel
Bacher, Gerd
Mertin, Wolfgang
Funding for this research was provided by:
Deutsche Forschungsgemeinschaft (ME 1173/4-1, NE 1633/2-1)
Consejo Nacional de Ciencia y TecnologĂa (252826)
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