The effect of Al content, substrate temperature and nitrogen flow rate on optical band gap and optical features of nanostructured TiAlN thin films prepared by reactive magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s00339-016-0515-8
Published Online: 2016-10-24
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jalali, Reza
Parhizkar, Mojtaba
Bidadi, Hassan
Naghshara, Hamid
Hosseini, Seyd Reza
Jafari, Majid
License valid from 2016-10-24