Effect of boron incorporation on slow interface traps in SiO2/4H-SiC structures
Crossref DOI link: https://doi.org/10.1007/s00339-016-0724-1
Published Online: 2017-01-30
Published Print: 2017-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Okamoto, Dai http://orcid.org/0000-0003-2494-1764
Sometani, Mitsuru
Harada, Shinsuke
Kosugi, Ryoji
Yonezawa, Yoshiyuki
Yano, Hiroshi
License valid from 2017-01-30