Microwave plasma-assisted ALD of Al2O3 thin films: a study on the substrate temperature dependence of various parameters of interest
Crossref DOI link: https://doi.org/10.1007/s00339-017-0830-8
Published Online: 2017-02-23
Published Print: 2017-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Thomas, Subin
Nalini, Savitha
Kumar, K. Rajeev
License valid from 2017-02-23