Impact of process parameters on the structural and electrical properties of metal/PZT/Al2O3/silicon gate stack for non-volatile memory applications
Crossref DOI link: https://doi.org/10.1007/s00339-018-1555-z
Published Online: 2018-01-09
Published Print: 2018-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Singh, Prashant http://orcid.org/0000-0002-4846-554X
Jha, Rajesh Kumar
Singh, Rajat Kumar
Singh, B. R.
Text and Data Mining valid from 2018-01-09
Article History
Received: 16 October 2017
Accepted: 4 January 2018
First Online: 9 January 2018