Influence of deposition temperature during LPCVD on surface properties of ultrathin polysilicon films
Crossref DOI link: https://doi.org/10.1007/s00542-017-3501-y
Published Online: 2017-08-10
Published Print: 2018-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
MichaĆowski, Marcin http://orcid.org/0000-0002-6946-6840
Voicu, Rodica
Obreja, Cosmin
Baracu, Angela
Muller, Raluca
Rymuza, Zygmunt
License valid from 2017-08-10