Fabrication of nanopores in multi-layered silicon-based membranes using focused electron beam induced etching with XeF2 gas
Crossref DOI link: https://doi.org/10.1007/s00604-015-1557-x
Published Online: 2015-07-10
Published Print: 2016-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Liebes-Peer, Yael
Bandalo, Vedran
Sökmen, Ünsal
Tornow, Marc
Ashkenasy, Nurit
Text and Data Mining valid from 2015-07-10