Development and application of a multipurpose electrodeposition cell configuration for studying plating processes on wafer specimen and for characterizing surface films by scanning electrochemical microscopy
Crossref DOI link: https://doi.org/10.1007/s10800-017-1124-8
Published Online: 2017-10-04
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hanekamp, Patrick
Robl, Werner
Matysik, Frank-Michael
License valid from 2017-10-04