Mechanism of the Adhesive Interaction of Diazoquinone-Novolac Photoresist Films with Monocrystalline Silicon
Crossref DOI link: https://doi.org/10.1007/s10812-020-01049-4
Published Online: 2020-09-11
Published Print: 2020-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Brinkevich, S. D.
Grinyuk, E. V.
Brinkevich, D. I.
Sverdlov, R. L.
Prosolovich, V. S.
Pyatlitski, A. N.
Text and Data Mining valid from 2020-09-01
Version of Record valid from 2020-09-01
Article History
Received: 11 May 2020
First Online: 11 September 2020