Wet chemical etching of ZnO films using NH x -based (NH4)2CO3 and NH4OH alkaline solution
Crossref DOI link: https://doi.org/10.1007/s10853-017-1409-7
Published Online: 2017-07-24
Published Print: 2017-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Jae-Kwan
Lee, Ji-Myon
Funding for this research was provided by:
National Research Foundation of Korea (2014R1A6A1030419 and NRF-2015R1D1A1A01061005)
License valid from 2017-07-24