Atmospheric pressure atomic layer deposition of iron oxide nanolayer on the Al2O3/SiO2/Si substrate for mm-tall vertically aligned CNTs growth
Crossref DOI link: https://doi.org/10.1007/s10853-020-04922-x
Published Online: 2020-06-25
Published Print: 2020-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Vahdatifar, Sahar
Mortazavi, Yadollah
Khodadadi, Abbas Ali http://orcid.org/0000-0002-1431-5340
Text and Data Mining valid from 2020-06-25
Version of Record valid from 2020-06-25
Article History
Received: 8 January 2020
Accepted: 7 June 2020
First Online: 25 June 2020
Compliance with ethical standards
:
: All authors declare no conflicts of interest in this paper.