Study of electrical and micro-structural properties of high-κ gate dielectric stacks deposited using pulse laser deposition for MOS capacitor applications
Crossref DOI link: https://doi.org/10.1007/s10854-014-2011-2
Published Online: 2014-05-27
Published Print: 2014-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Srivastava, A.
Mangla, O.
Nahar, R. K.
Gupta, V.
Sarkar, C. K.
Text and Data Mining valid from 2014-05-27