Annealing temperature dependence on the structural and optical properties of sputtering-grown high-k HfO2 gate dielectrics
Crossref DOI link: https://doi.org/10.1007/s10854-014-2144-3
Published Online: 2014-07-09
Published Print: 2014-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Deng, B.
He, G.
Chen, X. S.
Chen, X. F.
Zhang, J. W.
Liu, M.
Lv, J. G.
Sun, Z. Q.
Text and Data Mining valid from 2014-07-09