Highly crystalline silicon carbide thin films grown at low substrate temperature by HWCVD technique
Crossref DOI link: https://doi.org/10.1007/s10854-014-2550-6
Published Online: 2014-11-29
Published Print: 2015-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jha, Himanshu S.
Agarwal, Pratima
Text and Data Mining valid from 2014-11-29