Surface and interface studies of RF sputtered HfO2 thin films with working pressure and gas flow ratio
Crossref DOI link: https://doi.org/10.1007/s10854-015-3179-9
Published Online: 2015-05-17
Published Print: 2015-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Das, K. C.
Ghosh, S. P.
Tripathy, N.
Bose, G.
Ashok, A.
Pal, P.
Kim, D. H.
Lee, T. I.
Myoung, J. M.
Kar, J. P.
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