Evolution of nanostructure in hydrogenated amorphous silicon thin films with substrate temperature studied by Raman mapping, Raman scattering and spectroscopic ellipsometry
Crossref DOI link: https://doi.org/10.1007/s10854-017-6618-y
Published Online: 2017-03-03
Published Print: 2017-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Madaka, Ramakrishna
Kanneboina, Venkanna
Agarwal, Pratima
License valid from 2017-03-03