Solution processed boron doped indium oxide thin-film as channel layer in thin-film transistors
Crossref DOI link: https://doi.org/10.1007/s10854-019-02222-y
Published Online: 2019-09-26
Published Print: 2019-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Arulkumar, S.
Parthiban, S. http://orcid.org/0000-0003-1479-5660
Gnanaprakash, D.
Kwon, J. Y.
Text and Data Mining valid from 2019-09-26
Version of Record valid from 2019-09-26
Article History
Received: 15 May 2019
Accepted: 18 September 2019
First Online: 26 September 2019