Chemical Mechanical Polishing for SiO2 Film Using Polystyrene@ceria (PS@CeO2) Core–Shell Nanocomposites
Crossref DOI link: https://doi.org/10.1007/s10904-015-0253-y
Published Online: 2015-06-24
Published Print: 2015-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chen, Ailian
Wang, Yayun
Qin, Jiawei
Li, Zefeng
Text and Data Mining valid from 2015-06-24