Study of Artifact-Resistive Technology Based on a Novel Dual Photoplethysmography Method for Wearable Pulse Rate Monitors
Crossref DOI link: https://doi.org/10.1007/s10916-015-0412-2
Published Online: 2015-12-08
Published Print: 2016-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhou, Congcong
Feng, Jingjie
Hu, Jun
Ye, Xuesong
Funding for this research was provided by:
National Science and Technology Major Project of the Ministry of Science and Technology of China (2013ZX03005008)
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