Optical and electronic properties of Mo:ZnO thin films deposited using RF magnetron sputtering with different process parameters
Crossref DOI link: https://doi.org/10.1007/s11082-015-0357-1
Published Online: 2016-01-07
Published Print: 2016-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chen, Tao-Hsing
Jian, Bo-Lun
Funding for this research was provided by:
Ministry of Science and Technology, Taiwan (TW) (102-2212-E-151-006-MY3)
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