Fluid Simulation of Capacitively Coupled HBr/Ar Plasma for Etching Applications
Crossref DOI link: https://doi.org/10.1007/s11090-016-9726-1
Published Online: 2016-06-22
Published Print: 2016-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Gul, Banat
Rehman, Aman-ur
License valid from 2016-06-22