Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas
Crossref DOI link: https://doi.org/10.1007/s11090-016-9737-y
Published Online: 2016-08-02
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Junmyung
Efremov, Alexander
Lee, Byung Jun
Kwon, Kwang-Ho
License valid from 2016-08-02