Abatement of Gaseous Xylene Using Double Dielectric Barrier Discharge Plasma with In Situ UV Light: Operating Parameters and Byproduct Analysis
Crossref DOI link: https://doi.org/10.1007/s11090-016-9741-2
Published Online: 2016-08-22
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shi, Yao
Shao, Zhenhua
Shou, Tianyu
Tian, Rubin
Jiang, Jianqing
He, Yi
License valid from 2016-08-22