One-Step Synthesis of Silicon Oxynitride Films Using a Steady-State and High-Flux Helicon-Wave Excited Nitrogen Plasma
Crossref DOI link: https://doi.org/10.1007/s11090-017-9822-x
Published Online: 2017-05-19
Published Print: 2017-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Huang, Tianyuan
Jin, Chenggang
Yu, Jun
Yang, Yan
Zhuge, Lanjian
Wu, Xuemei
Sha, Zhendong
License valid from 2017-05-19