Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of $$\hbox {TiO}_2$$ TiO 2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition
Crossref DOI link: https://doi.org/10.1007/s11090-019-09961-0
Published Online: 2019-02-15
Published Print: 2019-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xu, Yu
Zhang, Yu
Li, Linjun
Ding, Ke
Guo, Ying
Shi, Jianjun
Huang, Xiaojiang
Zhang, Jing
Text and Data Mining valid from 2019-02-15
Article History
Received: 28 June 2018
Accepted: 20 January 2019
First Online: 15 February 2019