Etching Kinetics and Surface Conditions for KNbxOy Thin Films with Fluorine- and Chlorine-Based Plasma Chemistries
Crossref DOI link: https://doi.org/10.1007/s11090-020-10064-4
Published Online: 2020-01-24
Published Print: 2020-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lim, Nomin
Efremov, Alexander
Hwang, Hyun-Gyu
Nahm, Sahn
Kwon, Kwang-Ho
Text and Data Mining valid from 2020-01-24
Version of Record valid from 2020-01-24
Article History
Received: 8 November 2019
Accepted: 19 January 2020
First Online: 24 January 2020