Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s11164-015-1991-8
Published Online: 2015-03-15
Published Print: 2015-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Brunclíková, M.
Hubička, Z.
Kment, Š.
Olejníček, J.
Čada, M.
Kšírová, P.
Krýsa, J.
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