Fast Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement and Its Application
Crossref DOI link: https://doi.org/10.1007/s11390-015-1549-7
Published Online: 2015-05-01
Published Print: 2015-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Geng, Zhen
Shi, Zheng
Yan, Xiao-Lang
Luo, Kai-Sheng
Pan, Wei-Wei
Text and Data Mining valid from 2015-05-01