Total ionizing dose effects and annealing behaviors of HfO2-based MOS capacitor
Crossref DOI link: https://doi.org/10.1007/s11432-017-9239-5
Published Online: 2017-11-06
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xu, Yannan
Bi, Jinshun
Xu, Gaobo
Xi, Kai
Li, Bo
Liu, Ming
License valid from 2017-11-06