Modeling and physical mechanism analysis of the effect of a polycrystalline-ferroelectric gate on FE-FinFETs
Crossref DOI link: https://doi.org/10.1007/s11432-022-3501-7
Published Online: 2023-04-04
Published Print: 2023-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, Chengxu
Yu, Hao
Wang, Yichen
Zhang, Zichong
Miao, Xiangshui
Wang, Xingsheng
Text and Data Mining valid from 2023-04-04
Version of Record valid from 2023-04-04
Article History
Received: 16 January 2022
Revised: 16 March 2022
Accepted: 17 May 2022
First Online: 4 April 2023