Surface plasmon-assisted nano-lithography with a perfect contact aluminum mask of a hexagonal dot array
Crossref DOI link: https://doi.org/10.1007/s11468-016-0180-y
Published Online: 2016-01-26
Published Print: 2016-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Eun Sung
Kim, Yong Min
Choi, Kyung Cheol
Funding for this research was provided by:
National Research Foundation of Korea(NRF) grant funded by the Korea government (NRF-2014R1A2A2A01005770)
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